A popular method for adhering thin films onto a substrate. Sputtering is done by bombarding a target material with a charged gas (typically argon) which releases atoms in the target that coats the nearby substrate. It all takes place inside a magnetron vacuum chamber under low pressure. See thin film.
 | Reproduced with permission from Computer Desktop Encyclopedia. Copyright (c) 1981-2008 The Computer Language Company Inc. All rights reserved. |
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